Raw Material Sales

Raw Material Sales

　 
J-Material Co., Ltd. is an agent of various bulk gas, special gas, vacuum supply gas cylinder, and can provide customers as IC semiconductor industry , wafer manufacturing, panel manufacturing production or used for high-end gas raw materials such as electronic industry.
 
The bulk gases provided by J-Material include argon (Ar), carbon dioxide (Co2), helium (He), etc, which are for customers with large gas consumption:
 
Carbon dioxide (Co2) is a common compound in the air. It is a colorless, odorless, non-combustible and non-flammable gas under normal pressure. The solid state of carbon dioxide is dry ice. Dry ice sublimates directly to a gas at room temperature. Carbon dioxide needs to be pressurized to 5.1 times atmospheric pressure to exist as a liquid. We provide customers with a variety of supply methods: cryogenic storage tanks of 5T~50T, 35-ton trailers, 15-ton tankers and small cylinders of various capacities.
 
Argon (Ar2) is a colorless and odorless inert gas. In high concentrations, it can cause suffocation. Argon is an atmospheric gas generally obtained by separating air. It is mainly used as an inert shielding gas for independent use or special mixed gas in welding type. We provide supply methods such as 175L liquid tank, 0.5L~67L steel cylinder, and 10T~50T storage tank.
 
​​​Helium (He) is a rare gas, a colorless and odorless inert gas, chemically inactive, and it is difficult to react with other substances under normal conditions. Helium is indispensable in many industrial fields. For example, creating an inert gas environment in welding, heat treatment and epitaxial crystal growth; cleaning semiconductors, etc.

In addition to the above bulk gases, we also represents a variety of special gases. Special gases can basically be divided into inert gases, flammable gases and corrosive gases. The special gases we represent are SiH4, PH3, BF3, AsH3, GeF4, N2O, DCS and TCS. The gas packaging method can be based on customer needs. J-Material also provides a series of gas cylinder cabinet solutions for large-capacity gas application requirements. Among them, BF3, AsH3, GeF4 and PH3 are vacuum supply gas cylinder gas.
 

The principle of vacuum supply gas cylinder:

In the semiconductor manufacturing process, hazardous and toxic gases are often used, and these gases are usually transported in a high-density form (such as a high-pressure gas cylinder) by means of compression or liquefaction. However, due to the accidental release of high-pressure gas in large quantities, or the leakage of dangerous gas caused by the leakage of the gas cylinder itself, serious injury or death can be caused. 
 
Instead, using a substrate with nano-sized pores that can carry gas molecules by adsorption or bonding, etc., reduces the pressure inside the cylinder and actually reduces the chance of accidental gas leakage. Applying such new technology and commercializing such products, whichever is used in the storage and transportation of dangerous gases, has a higher level of safety.
 
The vacuum supply gas cylinder uses an adsorbent material called BrightBlack, a carbon material with precise nano-scale pores. When gas molecules encounter an adsorbent material, they are attracted to the solid material, move into the pores of the material, and become anchored therein. Considering that different types of gas molecules have different volume characteristics, after precise calculation, BrightBlack carbon material has optimized pore size and material density, so it can achieve the most ideal physical adsorption degree for different dangerous gas molecules. .